Advanced Materials Research

Electronic ceramics

We are promoting the development of materials to be applied to featuring semiconductor manufacturing equipment by using plasma CVD-SiC nanoparticle and large ceramic sintering technology.

ESC with heater

Our ESC has a heating function in addition to the conventional wafer chucking function and realizes wafer surface temperature uniformity and excellent controllability.

Yttria-based ceramics (conductive yttria)

Our conductive yttria can control the conductivity in a wide range by adjusting the amount of conductive material added and the dispersion state.
The material has high resistance to halogen gas plasma, in addition to high electrical conductivity, and the feature suits for use in semiconductor manufacturing equipment.